Dr. Bing Lu Profile

Dr. Bing Lu

at Freescale Semiconductor Inc

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 6 December 2004 Paper

Defect printability and inspection of EUVL mask

Bing Lu, James Wasson, Pawitter Mangat, Jonathan Cobb, Scott Hector, Donald Pettibone, Donna O'Connell

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Multilayers, Defect detection, Inspection, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

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Proceedings Article | 20 May 2004 Paper

Process latitude measurements and their implications for CD control in EUV lithography

Jonathan Cobb, Richard Peters, Sergei Postnikov, Scott Hector, Bing Lu, Eric Weisbrod, James Wasson, Pawitter Mangat, Donna O'Connell

Proc. SPIE. 5374, Emerging Lithographic Technologies VIII

KEYWORDS: Lithography, Data modeling, Scanners, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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SPIE Journal Paper | 1 April 2004

Effects of reticle reflectance on lithography

Kevin Cummings, Bernd Geh, Bing Lu, James Wasson, Pawitter Mangat

JM3 Vol. 3 Issue 02

KEYWORDS: Photomasks, Reflectivity, Reticles, Semiconducting wafers, Reflection, Lithography, Quartz, Light scattering, Critical dimension metrology, Chromium

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Proceedings Article | 17 December 2003 Paper

Effects of reticle reflectance on lithography

Kevin Cummings, Bernd Geh, Bing Lu, James Wasson, Eric Weisbrod, William Dauksher, Kevin Nordquist, Pawitter Mangat

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Reticles, Reflection, Quartz, Light scattering, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 17 December 2003 Paper

EUV radiation damage test on EUVL mask absorber materials

Bing Lu, James Wasson, Sang-In Han, Pawitter Mangat, Victoria Golovkina, Franco Cerrina

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Deep ultraviolet, Spectroscopy, Hydrogen, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography

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Proceedings Article | 17 December 2003 Paper

157-nm attenuated phase-shift mask materials with irradiation stability

James Wasson, Nora Edwards, Bing Lu, Pawitter Mangat, Andrew Grenville

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Optical properties, Reflection, Inspection, Chromium, Attenuators, Photomasks, Vacuum ultraviolet, Semiconducting wafers, Phase shifts

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Proceedings Article | 17 December 2003 Paper

CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication

Bing Lu, James Wasson, Eric Weisbrod, Pawitter Mangat, Eric Ainley, Adolpho Rios, Kevin Nordquist

Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Quartz, Ultraviolet radiation, Diffusion, Extreme ultraviolet lithography, Mask making, Lutetium, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 16 June 2003 Paper

Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication

Bing Lu, Eric Weisbrod, Pawitter Mangat, Kevin Nordquist, Eric Ainley

Proc. SPIE. 5037, Emerging Lithographic Technologies VII

KEYWORDS: Etching, Silicon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 2 June 2003 Paper

Simulation of repairing thin-film phase defect in masks for EUV lithography

Yeong-Uk Ko, David Joy, Scott Hector, Bing Lu

Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII

KEYWORDS: Thin films, Electron beams, Gaussian beams, Electrons, Diffusion, Monte Carlo methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects

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Proceedings Article | 27 December 2002 Paper

Image placement error due to pattern transfer for EUV masks

Zorian Masnyj, James Wasson, Bing Lu, Eric Weisbrod, Pawitter Mangat, Kevin Nordquist, Eric Ainley, William Dauksher, Douglas Resnick

Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Reticles, Etching, Image processing, Chromium, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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Proceedings Article | 1 July 2002 Paper

Inspection of EUV reticles

Donald Pettibone, Andrei Veldman, Ted Liang, Alan Stivers, Pawitter Mangat, Bing Lu, Scott Hector, James Wasson, Kenneth Blaedel, Emily Fisch, David Walker

Proc. SPIE. 4688, Emerging Lithographic Technologies VI

KEYWORDS: Multilayers, Reticles, Deep ultraviolet, Glasses, Silicon, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 20 August 2001 Paper

Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication

Bing Lu, Zorian Masnyj, Pawitter Mangat, Kevin Nordquist, Eric Ainley, Douglas Resnick

Proc. SPIE. 4343, Emerging Lithographic Technologies V

KEYWORDS: Silicon, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Chemically amplified resists

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Proceedings Article | 25 June 1999 Paper

Novel fiducial grid for x-ray masks

Choi Soo, Shobhna Chandra, Kong Jong Ren, Antony Bourdillon, Bing Lu

Proc. SPIE. 3676, Emerging Lithographic Technologies III

KEYWORDS: Confocal microscopy, Lithography, Microscopes, Electron beam lithography, Luminescence, X-rays, Photomasks, Synchrotrons, Semiconducting wafers, X-ray lithography

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Proceedings Article | 25 June 1999 Paper

Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique

Bing Lu, Paul Dentinger, James Taylor, Gilbert Feke, Dan Hessman, Qiang Wu, Robert Grober

Proc. SPIE. 3676, Emerging Lithographic Technologies III

KEYWORDS: Lithography, FT-IR spectroscopy, Luminescence, X-rays, Hydrogen, Nondestructive evaluation, Semiconducting wafers, X-ray lithography, Halogens, Chemically amplified resists

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Proceedings Article | 5 June 1998 Paper

Surface chemistry of GaAs wafers and reaction with chemically amplified resists during resist processing

Bing Lu, Olga Vladimirsky, James Taylor, Niru Dandekar

Proc. SPIE. 3331, Emerging Lithographic Technologies II

KEYWORDS: Oxides, Optical lithography, Spectroscopy, Ions, Gallium arsenide, Mass spectrometry, Chemical analysis, Photoresist processing, Semiconducting wafers, Gallium

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Showing 5 of 15 publications

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