Dr. Bo Su
Sr. Director of Product Management at D2S Inc
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Publications (31)

Proceedings Article | 7 October 2020 Presentation + Paper
Proc. SPIE. 11518, Photomask Technology 2020

Proceedings Article | 31 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 3 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Semiconductors, Lithography, Lithography, Manufacturing, Manufacturing, Physics, Physics, Photomasks, Extreme ultraviolet, Extreme ultraviolet, Semiconductor manufacturing, Semiconductor manufacturing, Optical proximity correction, Optical proximity correction, Semiconducting wafers, Semiconducting wafers, Vestigial sideband modulation, Vestigial sideband modulation

Proceedings Article | 31 October 2017 Presentation + Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Point spread functions, Data modeling, Scattering, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Raster graphics, Electro optical modeling, Process modeling, Vestigial sideband modulation

Proceedings Article | 13 July 2017 Paper
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Modulation, Etching, Image processing, Photomasks, Computational lithography, Optical proximity correction, Convolution, Mask making, Model-based design, Process modeling

Showing 5 of 31 publications
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