Mr. Brent E. Boerger Profile

Brent E. Boerger

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Publications (7)

Proceedings Article | 21 June 2006 Paper

Design for manufacturing validation tool: fast and reliable conversion of SEM images to GDS images

D. Ronning, D. Ducharme, R. Selzer, B. Boerger, M. Yu, B. Xing, M. Trybendis, B. Grenon

Proceedings Volume 6281, 62810Y (2006) https://doi.org/10.1117/12.692747

KEYWORDS: Scanning electron microscopy, Image processing, Microscopes, Computer aided design, Image resolution, Interfaces, Inspection, Signal to noise ratio, Design for manufacturing, Lithography

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Proceedings Article | 24 March 2006 Paper

Advanced x-ray mask inspection system (AXIS) using scanning electron microscopy for sub-70-nm die-to-database inspections

Brent Boerger, Mengchen Yu, Robert Selzer, Yungsheng Ma, Donald Ronning, Donald Ducharme, Brian Grenon, Michael Trybendis

Proceedings Volume 6152, 61521N (2006) https://doi.org/10.1117/12.659447

KEYWORDS: Scanning electron microscopy, Inspection, Photomasks, Human-machine interfaces, Computer aided design, Image processing, Control systems, X-rays, Lithography, Sensors

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Proceedings Article | 24 March 2006 Paper

Proximity lithography membrane mask aeroelasticity

Dryver Huston, Dylan Burns, Brent Boerger, Robert Selzer

Proceedings Volume 6151, 61513D (2006) https://doi.org/10.1117/12.660798

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Mechanics, Helium, Silicon carbide, Mathematical modeling, X-rays, Silicon, Microfluidics

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Proceedings Article | 20 May 2004 Paper

Predicting image placement accuracy of x-ray masks

Gerald Dicks, Roxann Engelstad, Edward Lovell, Brent Boerger, Daniel Fleming, Karen Brown

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546200

KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Silicon carbide, X-rays, 3D modeling, Silicon, Etching, X-ray lithography, Chromium

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Proceedings Article | 20 May 2004 Paper

Collimated laser-plasma lithography (CPL) for 90-nm and smaller contacts and vias

Richard Forber, Celestino Gaeta, Heinz Siegert, Scott McLeod, Brent Boerger

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534379

KEYWORDS: X-rays, Photomasks, Lithography, X-ray lithography, Collimators, Collimation, Amplifiers, Plasma, Semiconducting wafers, X-ray optics

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Proceedings Article | 7 January 2004 Paper

High-power laser-produced plasma source for nanolithography

Richard Forber, Celestino Gaeta, Harry Rieger, Heinz Siegert, Scott McLeod, Brent Boerger

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.514053

KEYWORDS: X-rays, Extreme ultraviolet, Amplifiers, Lithography, Plasma, Tin, Laser development, Collimation, Collimators, Extreme ultraviolet lithography

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Proceedings Article | 16 June 2003 Paper

Advances in CPL, collimated plasma source, and full-field exposure for sub-100-nm lithography

Brent Boerger, Scott McLeod, Richard Forber, I. C. Edmond Turcu, Celestino Gaeta, Donald Bailey, Jacob Ben-Jacob

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485436

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Collimation, X-rays, Plasma, Optical alignment, Photoresist processing, Collimators, Nanolithography

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Showing 5 of 7 publications

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