Dr. Brian Martin
Principal Engineer at X-FAB UK Ltd
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Modeling, Point spread functions, Reticles, Etching, Image processing, Manufacturing, Photomasks, Chlorine, Laser manufacturing, Semiconducting wafers

Proceedings Article | 22 August 2001 Paper
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Semiconductors, Modeling, Lithography, Refractive index, Optical lithography, Interfaces, Oxygen, Scanning electron microscopy, Semiconducting wafers, Array processing

Proceedings Article | 22 August 2001 Paper
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Oxides, Thin films, Lithography, Antireflective coatings, Dielectrics, Reflectivity, Process control, CMOS technology, Critical dimension metrology, Chemical mechanical planarization

Proceedings Article | 22 August 2001 Paper
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Matrices, Data processing, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, OLE for process control

Proceedings Article | 26 April 2001 Paper
Proc. SPIE. 4404, Lithography for Semiconductor Manufacturing II
KEYWORDS: Microelectromechanical systems, Lithography, Optical lithography, Data modeling, Diffusion, Ultrasonics, Photoresist materials, Optical simulations, Photoresist developing, Picture Archiving and Communication System

Showing 5 of 38 publications
Conference Committee Involvement (4)
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XVIII
23 February 2004 | Santa Clara, California, United States
Metrology, Inspection, and Process Control for Microlithography XVII
24 February 2003 | Santa Clara, California, United States
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