Dr. Brian E. Newnam Profile

Dr. Brian E. Newnam

Retired

SPIE Involvement:

Author

Proceedings Article | 13 May 1997 Paper

Surface damage resistance of calcite crystals to nanosecond-pulse 694-nm laser radiation

Brian Newnam, Larry DeShazer

Proceedings Volume 2966, (1997) https://doi.org/10.1117/12.274295

KEYWORDS: Calcite, Surface finishing, Crystals, Laser crystals, Laser damage threshold, Resistance, Polishing, Ruby lasers, Laser scattering, Laser induced damage

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Proceedings Article | 26 June 1996 Paper

Directional wind measurement derived from elastic backscatter lidar data in real time

David Moore, Stephen White, Robert Karl, Brian Newnam

Proceedings Volume 2748, (1996) https://doi.org/10.1117/12.243559

KEYWORDS: LIDAR, Aerosols, Algorithm development, Velocity measurements, Backscatter, Wind measurement, Signal detection, Sensors, Software development, Meteorology

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Proceedings Article | 24 June 1993 Paper

XUV projection lithography: is optical surface contamination an important limitation?

Marion Scott, Brian Newnam

Proceedings Volume 1848, (1993) https://doi.org/10.1117/12.147393

KEYWORDS: Contamination, Extreme ultraviolet, Projection lithography, Carbon, Oxides, Aluminum, Mirrors, Silicon, Reflectivity, Oxygen

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Proceedings Article | 24 June 1993 Paper

Optical degradation issues for XUV projection lithography systems

Brian Newnam

Proceedings Volume 1848, (1993) https://doi.org/10.1117/12.147391

KEYWORDS: Contamination, Mirrors, Extreme ultraviolet, Plasma, Photomasks, Carbon, Reflectivity, Projection lithography, Multilayers, Silicon

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Proceedings Article | 9 July 1992 Paper

Development of XUV projection lithography at 60-80 nm (Poster Paper)

Brian Newnam, Vriddhachalam Viswanathan

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136044

KEYWORDS: Photomasks, Lithography, Extreme ultraviolet, Reflectivity, Reflectors, Mirrors, Imaging systems, Free electron lasers, Projection lithography, Reflection

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Proceedings Article | 1 December 1991 Paper

Development of an XUV-IR free-electron laser user facility for scientific research and industrial applications

Brian Newnam, Roger Warren, Steven Conradson, John Goldstein, Brian McVey, Mark Schmitt, C. James Elliott, Michael Burns, Bruce Carlsten, Kwok-Chi Chan, W. Johnson, Tai-San Wang, Richard Sheffield, Karl Meier, R. Olsher, Marion Scott, J. Griggs

Proceedings Volume 1552, (1991) https://doi.org/10.1117/12.50602

KEYWORDS: Free electron lasers, Mirrors, Oscillators, Extreme ultraviolet, Resonators, Reflectivity, Electron beams, Aluminum, Photons, Silicon carbide

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SPIE Journal Paper | 1 August 1991

Extreme ultraviolet free-electron laser-based projection lithography systems

Brian Newnam

OE, Vol. 30, Issue 08, (August 1991) https://doi.org/10.1117/12.10.1117/12.55914

KEYWORDS: Free electron lasers, Extreme ultraviolet, Mirrors, Projection lithography, Reflectivity, Photomasks, Lithography, Semiconducting wafers, Projection systems, Reflection

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Proceedings Article | 1 June 1991 Paper

Thermal analysis of multifacet-mirror ring resonator for XUV free-electron lasers

Brian McVey, John Goldstein, Robert McFarland, Brian Newnam

Proceedings Volume 1441, (1991) https://doi.org/10.1117/12.57237

KEYWORDS: Mirrors, Resonators, Distortion, Free electron lasers, Extreme ultraviolet, Oscillators, Thermography, Electron beams, Thermal effects, Laser induced damage

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Proceedings Article | 1 February 1991 Paper

XUV free-electron laser-based projection lithography systems

Brian Newnam

Proceedings Volume 1343, (1991) https://doi.org/10.1117/12.23194

KEYWORDS: Free electron lasers, Extreme ultraviolet, Mirrors, Projection lithography, Reflectivity, Photomasks, Lithography, Projection systems, Reflection, Semiconducting wafers

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Proceedings Article | 1 May 1990 Paper

Development of free-electron lasers for XUV projection lithography

Brian Newnam

Proceedings Volume 1227, (1990) https://doi.org/10.1117/12.18611

KEYWORDS: Free electron lasers, Extreme ultraviolet, Mirrors, Reflectivity, Projection lithography, Lithography, Resonators, Photomasks, X-rays, X-ray lithography

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Proceedings Article | 1 May 1990 Paper

Research opportunities at the proposed Los Alamos XUV-FEL user facility

Steven Conradson, Brian Newnam

Proceedings Volume 1227, (1990) https://doi.org/10.1117/12.18612

KEYWORDS: Free electron lasers, Spectroscopy, Chemical species, Electronics, Magnetism, Photoemission spectroscopy, Extreme ultraviolet, Ions, Molecules, Spectroscopes

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