Brian S. Ward
Modeling Group CAE at Synopsys Inc
SPIE Involvement:
Publications (16)

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Lithography, Optical lithography, Optical proximity correction, Chromium, Model-based design, Logic, Optimization (mathematics), Semiconducting wafers, Critical dimension metrology

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: SRAF, Atrial fibrillation, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Photomasks, Model-based design, Manufacturing, Printing, Inspection

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Scanning electron microscopy, Metrology, Data modeling, Optical proximity correction, Electronic design automation, Semiconducting wafers, Manufacturing, Computer aided design, Photomasks, Critical dimension metrology

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Calibration, Optical lithography, Current controlled current source, Optical proximity correction

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Data modeling, Metrology, Scanning electron microscopy, Optical proximity correction, Calibration, Statistical modeling, Process modeling, Data analysis, Data visualization, Diffractive optical elements

Showing 5 of 16 publications
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