Bríd M. Connolly
Strategic Applications Manager at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 1 May 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Diffraction, Refractive index, Reticles, Etching, Scanners, Distortion, Photomasks, Extreme ultraviolet lithography, Tantalum, Absorption

Proceedings Article | 2 August 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Atomic force microscopy, Transmission electron microscopy, Signal processing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 9 November 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Refractive index, Finite-difference time-domain method, Deep ultraviolet, Silica, Polarization, Opacity, Phase shift keying, Near field, Photomasks, Phase measurement, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Binary data, Airborne remote sensing, 193nm lithography, Absorption

Proceedings Article | 26 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Switches, Polarization, Imaging systems, Spatial frequencies, 3D modeling, Printing, Phase retrieval, Photomasks, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 27 publications
Conference Committee Involvement (1)
33rd European Mask and Lithography Conference
26 June 2017 | Dresden, Germany
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