Mr. Bryan W. Reese Profile

Bryan W. Reese

Technical Specialist

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 25 September 2010 Paper

28N foundry reticle requal challenges and solutions for IC fabs

Mike Yeh, David Wu, Bo Mu, Bryan Reese

Proc. SPIE. 7823, Photomask Technology 2010

KEYWORDS: Reticles, Contamination, Defect detection, Air contamination, Metals, Inspection, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

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Proceedings Article | 11 May 2009 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI

KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

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Proceedings Article | 24 March 2009 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII

KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

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Proceedings Article | 17 October 2008 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proc. SPIE. 7122, Photomask Technology 2008

KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

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Proceedings Article | 25 October 2007 Paper

Characterizing contamination inspection capabilities using programmed defect test reticles

Anthony Nhiev, John Riddick, Joseph Straub, Trent Hutchinson, Bryan Reese, Aditya Dayal

Proc. SPIE. 6730, Photomask Technology 2007

KEYWORDS: Light sources, Reticles, Contamination, Optical spheres, Defect detection, Quartz, Manufacturing, Inspection, Photomasks, Computer aided design

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The ORION^TM series of test reticles have been used for many years as the photomask industry standard for evaluating contamination inspection algorithms. The deposition of Polystyrene Latex (PSL) spheres on various reticle pattern designs allow STARlight^TM tool owners to measure the relative contamination inspection performance in a consistent and quantifiable manner. However, with recent inspection technology advances such as shorter laser (light source) wavelengths and smaller inspection pixels, PSL spheres were observed to physically degrade over relatively short time periods: especially for the smallest sized spheres used to characterize contamination inspection performance at the most advanced technology nodes. Investigations into using alternative materials or methods that address the issue of PSL shrinkage have not yet proven completely successful. Problems such as failure to properly adhere to reticle surfaces or identification of materials that can produce consistent and predictable sphere sizes for the reliable manufacture of these critical test masks are only some of the challenges that must be solved. Even if these and other criteria are met, the final substance must appear to inspection optics as pseudo soft defects which resemble actual contamination that inevitably appears on production reticle surfaces. In the interim, programmed pindot defects present in the quartz region of the SPICA^TM test reticle are being used to characterize contamination performance while a suitable long-term solution to address the issue of shrinking PSL spheres on ORION masks can be found. This paper examines the results of a programmed pindot test reticle specifically designed to evaluate contamination algorithms without the deposition of PSL spheres or similar structures. This alternative programmed pindot test reticle uses various background patterns similar to the ORION, however, it also includes multiple defects sizes and locations making it more desirable than the limited range of defects found on the SPICA.

Proceedings Article | 20 October 2006 Paper

High-resolution mask inspection in advanced fab

Stephanie Maelzer, Andre Poock, Bryan Reese, Kaustuve Bhattacharyya, Farzin Mirzaagha, Stephen Cox, Michael Lang

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Lithography, Reticles, Visualization, Metals, Inspection, Image transmission, Wafer inspection, Photomasks, Semiconducting wafers, Defect inspection

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Proceedings Article | 20 October 2006 Paper

Single pass die-to-database tritone reticle inspection capability

Bryan Reese, Jan Heumann, Norbert Schmidt

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Reticles, Detection and tracking algorithms, Sensors, Calibration, Databases, Image processing, Inspection, Photomasks, Neodymium, Binary data

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Proceedings Article | 23 March 2006 Paper

Building 1x NIL templates: challenges and requirements

Tony DiBiase, John Maltabes, Bryan Reese, Mohsen Ahmadian

Proc. SPIE. 6151, Emerging Lithographic Technologies X

KEYWORDS: Lithography, Reticles, Etching, Quartz, Manufacturing, Inspection, Image transmission, Photomasks, Nanoimprint lithography, Defect inspection

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Proceedings Article | 6 December 2004 Paper

Chromeless phase lithography reticle defect inspection challenges and solutions

Larry Zurbrick, Anthony Vacca, Byran Reese, Douglas Van Den Broeke, Stephen Hsu, Darren Taylor, Bryan Kasprowicz

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Etching, Quartz, Manufacturing, Inspection, Photomasks, Resolution enhancement technologies

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Proceedings Article | 28 August 2003 Paper

Automatic inspection tool sensitivity with characterization of AAPSM defects

Darren Taylor, Eric Poortinga, Bryan Reese, Blake Gibson

Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X

KEYWORDS: Lithography, Phase shifting, Etching, Glasses, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, 193nm lithography, Defect inspection

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Proceedings Article | 22 January 2001 Paper

OPC reticle inspection techniques

Aihua Dong, Bryan Reese

Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Reticles, Defect detection, Detection and tracking algorithms, Databases, Inspection, Feature extraction, Zoom lenses, Optical proximity correction, Semiconducting wafers, Defect inspection

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Showing 5 of 11 publications

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