Dr. Byoung-Ho Lee
Fellow at SK hynix Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (22)

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Data modeling, Scanners, Interferometry, Distortion, Process control, High volume manufacturing, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Interferometers, Image processing, Scanners, Manufacturing, Inspection, Interferometry, Control systems, Process control, Semiconducting wafers, Overlay metrology, Defect inspection

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Thin films, Multilayers, Finite-difference time-domain method, Polarization, Inspection, Reflectivity, Numerical analysis, Wafer inspection, Semiconducting wafers, Defect inspection

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Defect detection, Particles, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Wafer inspection, Semiconducting wafers, Front end of line, Defect inspection

Proceedings Article | 3 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Electronics, Metrology, Microscopy, Silicon, Inspection, Process control, High volume manufacturing, Phase measurement, Critical dimension metrology, Semiconducting wafers

Showing 5 of 22 publications
Conference Committee Involvement (15)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Showing 5 of 15 Conference Committees
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