We describe a simple concept of an in situ photolithographic technique by using a liquid crystal display panel as a configurable mask and a CCD (charge coupled device) camera as a simple imaging system. The successive operation of imaging and configurable masking enabled a real-time projection lithography process by the selective exposure of light through LCD (liquid crystal display) panel. A correction of a defect pattern could be also demonstrated by optimizing the exposure conditions and aligning the mismatches between imaging and the corresponding lithographic patterning.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.