Dr. Byongseog Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Error analysis, Double patterning technology, EUV optics, Overlay metrology, Scanners, Particles, Optical parametric oscillators, Lithography

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Overlay metrology, Metrology, Quality measurement, Signal processing, Image quality, Lithography, Target detection, Semiconducting wafers, Sensors, Etching

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Signal processing, Process control, Quality measurement, Lithography, Double patterning technology, Photomasks, Uncertainty analysis

Proceedings Article | 17 March 2015 Paper
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Dielectrics, Capacitors, Capacitance, Polymers, Ions, Scanning electron microscopy, Wet etching, Molecules, Yield improvement

Proceedings Article | 16 April 2011 Paper
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Photoresist materials, Oxides, Silicon, Silicon films, Semiconducting wafers, Photoresist developing, Diffusion, Ions, Gases, Chemical reactions

Showing 5 of 9 publications
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