Mr. Byung-Soo Chang Profile

Byung-Soo Chang

Senior Engineer at Tekscend Photomask Korea Inc

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Author

Publications (10)

Proceedings Article | 8 November 2005 Paper

Characteristics of RIE lag and pattern density effect in alternating aperture phase-shift masks

Byung-Soo Chang, Yoon-Young Chang, Hyun-Suk Bang, In-Soo Lee, Lee-Ju Kim, Chang-Nam Ahn, Hong-Suk Kim

Proceedings Volume 5992, 59923Q (2005) https://doi.org/10.1117/12.632022

KEYWORDS: Etching, Reactive ion etching, Quartz, Critical dimension metrology, Ions, Photomasks, Diffractive optical elements, Plasma, Atomic force microscopy, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Higher anisotropy and improved surface conditions for 90-nm-node MoSiON ICP dry etch

Dong-Soo Min, Byung-Soo Chang, Hyuk-Joo Kwon, Boo-Yeon Choi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467493

KEYWORDS: Etching, Chromium, Critical dimension metrology, Phase shifts, Photomasks, Diffractive optical elements, Dry etching, Fluorine, Manufacturing, Transmittance

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Proceedings Article | 27 December 2002 Paper

Characteristics of selective MoSiON etching in a chlorine plasma

Byung-Soo Chang, Dong-Soo Min, Hyuk-Joo Kwon, Boo-Yeon Choi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467492

KEYWORDS: Etching, Chromium, Plasma, Glasses, Plasma etching, Chlorine, Ions, Chemistry, Fluorine, Electrodes

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Proceedings Article | 16 August 2002 Paper

Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source

Hyuk-Joo Kwon, Dong-Soo Min, Pil-Jin Jang, Byung-Soo Chang, Boo-Yeon Choi, Soo-Hong Jeong

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479363

KEYWORDS: Chromium, Etching, Plasma, Photoresist materials, Photomasks, Manufacturing, Plasma etching, Inductance, Dry etching, Cadmium

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Proceedings Article | 1 August 2002 Paper

Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Se-Jong Choi, Han-Sun Cha, Si-Yeul Yoon, Yong-Dae Kim, Dong-Hyuk Lee, Jin-Min Kim, Jin-Su Kim, Dong-Soo Min, Pil-Jin Jang, Byung-Soo Chang, Hyuk-Joo Kwon, Boo-Yeon Choi, Sang-Soo Choi, Soo Hong Jeong

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476984

KEYWORDS: Etching, Plasma, Photomasks, Phase shifts, Plasma etching, Gases, Chlorine, Scanning electron microscopy, Anisotropic etching, Surface roughness

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There is considerable interest in phase shift masks as a route to extending the resolution, contrast, and depth of focus of lithographic tools beyond what is achievable with the normal chrome mask technology. A problem that has so far hindered the introduction of phase shift masks has been the difficulty of phase and transmittance control when a phase shift mask is applied to practical use. Also, to apply phase shift layer (MoSiON), it remains that effects several critical mask parameters including sidewall slope, surface roughness, and critical dimension. For these reasons, this process requires a high degree of control of the etch process of shift layer. So in this paper, we described a technique for the fabrication of phase shift masks by etch rate of a MoSiON layer. Etching experiments of MoSiON were performed using different fluorinated gas mixtures. Four of them, CF₄/O₂/He, SF₆/O₂/He, CHF₃/O₂/He and Cl₂/CF₄/O2/He were chosen for high etch rate, sidewall slope, and surface morphology. Each added gases had a unique property on the etch rate, anisotropy, surface roughness and sidewall morphology. Result indicates that vertical slope and smooth surface are obtained using the Cl₂/ CF₄/O₂/He and SF₆/O₂/He mixture. With increasing O₂ flow rate to the SF₆/O₂/He Plasma and added Cl₂ gas to the CF₄/O₂/He Plasma, the MoSiON etching profile becomes anisotropic without undercutting and trench profile. It is probably due to both increasing etch rate and sidewall passivation of Cl₂ ion flux. When Cl₂ gas was added to the CF₄/O₂/He Plasma, the small addition of chlorine was enough to protect the exposed sidewall of the undercutting, therefore, higher flow rate of chlorine had to be added to protect the sidewall of the undercutting by forming a sidewall passivation layer. These results show that both increasing O₂ flow rate to the SF₆/O₂/He Plasma and the addition of Cl₂ to the CF₄/O₂/He plasma are necessary in order to achieve a vertical profile and a smooth surface morphology.

Proceedings Article | 11 March 2002 Paper

Loading effect parameters of dry etcher system and their analysis in mask-to-mask loading and within mask loading

Hyuk-Joo Kwon, Dong-Soo Min, Pil-Jin Jang, Byung-Soo Chang, Boo-Yeon Choi, Soo-Hong Jeong

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458353

KEYWORDS: Chromium, Etching, Photoresist materials, Ions, Oxygen, Dry etching, Plasma, Photomasks, Binary data, Cadmium

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Proceedings Article | 5 September 2001 Paper

Dry etching of Cr layer and its loading effect

Hyuk-Joo Kwon, D. Min, Pil-Jin Jang, Byung-Soo Chang, Boo-Yeon Choi, Kyung Park, Soo-Hong Jeong

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438355

KEYWORDS: Chromium, Etching, Oxygen, Photomasks, Critical dimension metrology, Plasma, Photoresist materials, Dry etching, Binary data, Ions

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Proceedings Article | 22 January 2001 Paper

Dry etching technology of Cr and MoSi layers using high-density plasma source

Hyuk-Joo Kwon, Kwang-Sik Oh, Byung-Soo Chang, Boo-Yeon Choi, Kyung-Ho Park, Soo-Hong Jeong

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410733

KEYWORDS: Etching, Chromium, Plasma, Dry etching, Critical dimension metrology, Transmittance, Photoresist materials, Manufacturing, Photomasks, Anisotropic etching

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Proceedings Article | 19 July 2000 Paper

Applications of MICP source for next-generation photomask process

Hyuk-Joo Kwon, Byung-Soo Chang, Boo-Yeon Choi, Kyung Park, Soo-Hong Jeong

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392028

KEYWORDS: Etching, Photomasks, Plasma, Chromium, Plasma etching, Plasma generation, Dry etching, Manufacturing, Wet etching, Reactive ion etching

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Proceedings Article | 6 September 1995 Paper

Design study of a KAO telescope with a 1-m double-arch primary mirror

Il Kweon Moon, In Woo Han, Byung-Soo Chang, Hyun Kyu Kim, Myung K. Cho

Proceedings Volume 2542, (1995) https://doi.org/10.1117/12.218661

KEYWORDS: Mirrors, Telescopes, Optical instrument design, Space telescopes, Wavefronts, Finite element methods, Zerodur, Mirror pointing, Device simulation, Astronomical telescopes

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Showing 5 of 10 publications

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