Byung-Soo Chang
Senior Engineer at Toppan Photomasks Korea Ltd
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Author
Publications (10)

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Quartz, Ions, Atomic force microscopy, Photomasks, Critical dimension metrology, Reactive ion etching, Plasma, Phase shifts

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Electrodes, Glasses, Ions, Chemistry, Chromium, Plasma etching, Chlorine, Fluorine, Plasma

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Dry etching, Manufacturing, Chromium, Transmittance, Photomasks, Critical dimension metrology, Fluorine, Phase shifts

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Cadmium, Etching, Dry etching, Manufacturing, Chromium, Photoresist materials, Photomasks, Plasma etching, Inductance, Plasma

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Etching, Gases, Surface roughness, Scanning electron microscopy, Photomasks, Plasma etching, Chlorine, Anisotropic etching, Plasma, Phase shifts

Showing 5 of 10 publications
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