Dr. Byung-Sup Ahn Profile

Dr. Byung-Sup Ahn

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 10 April 2024 Presentation

MBMW's comprehensive requirements and roles for next EUV era and its mass production

Inhwan Noh, Heebom Kim, Jongmun Park, Jin Choi, Hojune Lee, Byung-Sup Ahn, Youngsu Sung, Sang-Hee Lee

Proceedings Volume PC12956, PC1295605 (2024) https://doi.org/10.1117/12.3009572

KEYWORDS: Extreme ultraviolet, Logic

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Proceedings Article | 16 October 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Byoung-Sup Ahn, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 10451, 1045117 (2017) https://doi.org/10.1117/12.2280502

KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

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Proceedings Article | 3 October 2016 Paper

The technical consideration of multi-beam mask writer for production

Sang Hee Lee, Byung-Sup Ahn, Jin Choi, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9985, 998506 (2016) https://doi.org/10.1117/12.2243129

KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Optical simulations, Electron beams, Photomasks, Optical lithography, Distortion, Modulation, Neodymium, Image registration

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Proceedings Article | 25 September 2010 Paper

Degradation of pattern quality due to strong electron scattering in EUV mask

Sang Hee Lee, Byung Sup Ahn, Han Ku Cho, Jin Choi, Rae Won Lee, Sang-Gyun Woo, Hee Bom Kim

Proceedings Volume 7823, 78230D (2010) https://doi.org/10.1117/12.864212

KEYWORDS: Photomasks, Extreme ultraviolet, Scattering, Monte Carlo methods, Ray tracing, Electron beam lithography, Molybdenum, Metals, Ion beams, Laser scattering

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Proceedings Article | 20 March 2010 Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

In-Yong Kang, Dongwan Kim, Byung-Sup Ahn, Hwan-Seok Seo, Cha-Won Koh, Tae Geun Kim, Seong-Sue Kim, Han-Ku Cho, Hoon Kim, Dong-Gun Lee

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

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Proceedings Article | 20 March 2010 Paper

A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

Byungsup Ahn, Liping Ren, Joo-on Park, David Chan, Iacopo Mochi, Toshio Nakajima, Kenneth Goldberg, Inyong Kang, Sang-in Han, Masahiro Kishimoto, Kyoungyong Cho, Sungmin Huh, Stefan Wurm, Thomas Laursen

Proceedings Volume 7636, 76360K (2010) https://doi.org/10.1117/12.846922

KEYWORDS: Photomasks, Wafer inspection, Inspection, Particles, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Mask making, High volume manufacturing

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Proceedings Article | 20 March 2010 Paper

Printability and inspectability of programmed pit defects on the masks in EUV lithography

Byung-Sup Ahn, Kenneth Goldberg, Iacopo Mochi, Dong-Gun Lee, Hwan-Seok Seo, Brian Cha, Dongwan Kim, Han-Ku Cho, In-Yong Kang, Seoung-Sue Kim, Cha-Won Koh, Sungmin Huh

Proceedings Volume 7636, 76361B (2010) https://doi.org/10.1117/12.847956

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect inspection, Extreme ultraviolet, Critical dimension metrology, Visibility, Ion beams, Atomic force microscopy, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Dong-Gun Lee, Seong-Sue Kim, In-Yong Kang, Sungmin Huh, Dongwan Kim, Han-Ku Cho, Hoon Kim, Hakseung Han, Byung-Sup Ahn, Hwan-Seok Seo

Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Silicon, Semiconducting wafers, Ruthenium, Extreme ultraviolet, Reflectivity, Phase shifts, Refractive index

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Proceedings Article | 27 March 2008 Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Dong Gun Lee, Seoung Sue Kim, Hwan-Seok Seo, Jaehyuck Choi, Byungsup Ahn, Takeo Watanabe, Gisung Yoon, Hoon Kim, Hiroo Kinoshita, Han Ku Cho, Han-Shin Lee, Sungmin Huh, Dongwan Kim

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 4 March 2008 Paper

Predicting conversion time of circuit design file by artificial neural networks

Ji-Hyeon Choi, Sung-Hoon Jang, Sang-Gyun Woo, Won-Tai Ki, Jee-Hyong Lee, Han-Ku Cho, Byoung-Sup Ahn

Proceedings Volume 6925, 69250W (2008) https://doi.org/10.1117/12.771771

KEYWORDS: Data conversion, Neural networks, Photomasks, Data modeling, Statistical analysis, Error analysis, Neurons, Statistical modeling, Explosives, Artificial intelligence

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Proceedings Article | 5 November 2005 Paper

Optimized distributed computing environment for mask data preparation

Sung-Hoon Jang, Sun Kang, Seong-Woon Choi, Woo-Sung Han, Yo-Han Choi, Ju-Mi Bang, Won-Tai Ki, Byoung-Sup Ahn, Min-Kyu Ji

Proceedings Volume 5992, 599214 (2005) https://doi.org/10.1117/12.632427

KEYWORDS: Optical proximity correction, Computing systems, Photomasks, Distributed computing, Manufacturing, Resolution enhancement technologies, Databases, Data conversion, Data storage, Silver

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Proceedings Article | 28 June 2005 Paper

Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Ji-Soong Park, Sang-Back Ma, Seung-Woon Choi, Won-Tai Ki, Byung-Sup Ahn, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617091

KEYWORDS: Photomasks, Chromium, Electron beam lithography, Double patterning technology, Computer simulations, Roentgenium, Semiconducting wafers, Factor analysis, Error analysis, Beam shaping

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Proceedings Article | 20 August 2004 Paper

Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Woo-Sung Han, Won-Tai Ki, Byoung-Sup Ahn, Ji-Hyeon Choi, Sung-Hoon Jang, Seung-Hune Yang, Sung-Woon Choi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557757

KEYWORDS: Photomasks, Critical dimension metrology, Modulation, Vestigial sideband modulation, Error analysis, Optical simulations, Electron beam lithography, Electron beams, Beam shaping, Data modeling

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Proceedings Article | 26 June 2003 Paper

Comparison of vector theories for aerial image calculation

Sonny Zinn, Jung-Min Sohn, Byoung Sup Ahn, Sung-Woon Choi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485354

KEYWORDS: Mathematical modeling, Polarization, Diffraction, Radio propagation, Optical lithography, Systems modeling, Light wave propagation, Optical simulations, Electromagnetic radiation, Fourier optics

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Showing 5 of 14 publications

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