Dr. Carl E. Hess
Director of Engineering at KLA Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 25 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Inspection, Inspection equipment, Factory automation, Manufacturing, High volume manufacturing, Control systems, Image processing, Semiconducting wafers, Roads

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Binary data, Logic, Pellicles, Lithography, Metals

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconducting wafers, Reticles, Photomasks, Inspection, Process control, Critical dimension metrology, Manufacturing, Signal processing, Metrology, Semiconductors

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Photomasks, Inspection, Critical dimension metrology, Scanning electron microscopy, Scanners, Semiconducting wafers, Manufacturing, Nanoimprint lithography, Feedback control

Showing 5 of 12 publications
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