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Carmen Osorio
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Publications (7)
Proceedings Article | 19 March 2015 Paper
Hybrid metrology implementation: server approach
Carmen Osorio, Padraig Timoney, Alok Vaid, Alex Elia, Charles Kang, Cornel Bozdog, Naren Yellai, Eyal Grubner, Toru Ikegami, Masahiko Ikeno
Proceedings Volume 9424, 94241H (2015) https://doi.org/10.1117/12.2087233
KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Reactive ion etching, Etching, Data processing, Data communications, Process control, Algorithm development
SPIE Journal Paper | 19 December 2014
Effect of measurement error budgets and hybrid metrology on qualification metrology sampling
Matthew Sendelbach, Niv Sarig, Koichi Wakamoto, Hyang Kyun (Helen) Kim, Paul Isbester, Masafumi Asano, Kazuto Matsuki, Carmen Osorio, Chas Archie
JM3, Vol. 13, Issue 04, 041414, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041414
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement
SPIE Journal Paper | 8 December 2014
Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension
Alok Vaid, Carmen Osorio, Jamie Tsai, Cornel Bozdog, Matthew Sendelbach, Eyal Grubner, Roy Koret, Shay Wolfling
JM3, Vol. 13, Issue 04, 041413, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041413
KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Image analysis, Modulation, Diffractive optical elements, Data modeling
SPIE Journal Paper | 1 October 2014
Addressing FinFET metrology challenges in 1× node using tilt-beam critical dimension scanning electron microscope
Xiaoxiao Zhang, Hua Zhou, Zhenhua Ge, Alok Vaid, Deepasree Konduparthi, Carmen Osorio, Stefano Ventola, Roi Meir, Ori Shoval, Roman Kris, Ofer Adan, Maayan Bar-Zvi
JM3, Vol. 13, Issue 04, 041407, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041407
KEYWORDS: Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides
Proceedings Article | 2 April 2014 Paper
Hybrid metrology universal engine: co-optimization
Alok Vaid, Carmen Osorio, Jamie Tsai, Cornel Bozdog, Matthew Sendelbach, Eyal Grubner, Roy Koret, Shay Wolfling
Proceedings Volume 9050, 905009 (2014) https://doi.org/10.1117/12.2048939
KEYWORDS: Semiconducting wafers, Metrology, Image analysis, Critical dimension metrology, Diffractive optical elements, Modulation, Scanning electron microscopy, Model-based design, Detection and tracking algorithms
Showing 5 of 7 publications
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