Mr. Carsten Kohler Profile

Carsten Kohler

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 23 March 2011 Paper

Focus drilling for increased process latitude in high-NA immersion lithography

Ivan Lalovic, Jason Lee, Nakgeuon Seong, Nigel Farrar, Michiel Kupers, Hans van der Laan, Tom van der Hoeff, Carsten Kohler

Proceedings Volume 7973, 797328 (2011) https://doi.org/10.1117/12.882391

KEYWORDS: Laser drilling, Lithography, Metrology, Semiconducting wafers, Electroluminescence, Optical lithography, Immersion lithography, Critical dimension metrology, Photomasks, Chromatic aberrations

Read Abstract +

Proceedings Article | 17 October 2008 Paper

OPC cycle time reduction and accuracy improvement by early access to advanced Tachyon modeling of TWINSCAN XT:1900i scanner

Peter Nikolsky, Tjitte Nooitgedagt, Paul van Adrichem, Jeroen Meessen, Carsten Kohler, Baukje Wisse, Stefan Hunsche

Proceedings Volume 7122, 712249 (2008) https://doi.org/10.1117/12.802204

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Scanning electron microscopy, Atrial fibrillation, Scanners, Aluminum, Photoresist processing, Photomasks, 3D modeling

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Imaging enhancements by polarized illumination: theory and experimental verification

Carsten Kohler, Wim de Boeij, Koen van Ingen-Schenau, Mark van de Kerkhof, Jos de Klerk, Haico Kok, Geert Swinkels, Jo Finders, Jan Mulkens, Damian Fiolka, Tilmann Heil

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599626

KEYWORDS: Polarization, Photomasks, Critical dimension metrology, Imaging systems, Semiconducting wafers, Line edge roughness, Fiber optic illuminators, Electroluminescence, Lithographic illumination, Reticles

Read Abstract +

Proceedings Article | 28 May 2003 Paper

Contact hole litho correlation with shape analysis

Maurice Janssen, Khalid Elbattay, Carsten Kohler

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515117

KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Americium, Lithography, Shape analysis, Phase shifts, Computer simulations, Photomasks

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Solutions for printing sub-100-nm contacts with ArF

Paul Graeupner, Aksel Goehnermeier, Martin Lowisch, Reiner Garreis, Donis Flagello, Steven Hansen, Robert Socha, Carsten Koehler

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474569

KEYWORDS: Photomasks, Printing, Nanoimprint lithography, Image processing, Lithography, Image filtering, Reticles, Binary data, Monochromatic aberrations, Electroluminescence

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years