Cecilia A. Montgomery
Lithography Process Engineer EUV MET / Outgassing at SUNY Poly SEMATECH
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Author
Publications (14)

Proceedings Article | 4 April 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers, Photoresist developing

Proceedings Article | 10 April 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Electron beams, Metrology, Data modeling, Atomic force microscopy, Optical testing, Scanning electron microscopy, Data acquisition, Optical simulations, Scanning probe microscopy, Semiconducting wafers

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Contamination, Hydrogen, Reflectivity, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Metals, Photons, Molecules, Electrons, Photoresist materials, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Chemically amplified resists

Showing 5 of 14 publications
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