Dr. Cesar M. Garza Profile

Dr. Cesar M. Garza

Photo Dev Manager at Freescale Semiconductor Inc

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 16 November 2007 Paper

The study of phase-angle and transmission specifications of 6% att-EAPSM for 90nm, 65nm, and 45nm node wafer manufacturing patterning process

Gong Chen, Cesar Garza

Proceedings Volume 6730, 67302R (2007) https://doi.org/10.1117/12.740717

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Manufacturing, Image transmission, Image processing, Optical lithography, Semiconductors, Quartz, Wafer manufacturing

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Proceedings Article | 2 April 2007 Paper

Early look into device level imaging with beyond water immersion

Will Conley, Scott Warrick, Cesar Garza, Pierre-Jerome Goirand, Jan-Willem Gemmink, David Van Steenwinckel

Proceedings Volume 6520, 65201L (2007) https://doi.org/10.1117/12.714341

KEYWORDS: Polarization, Refractive index, Photoresist materials, Water, Imaging devices, Lithography, Photomasks, Semiconductors, Photoresist developing, Manufacturing

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Proceedings Article | 29 March 2006 Paper

Improved ion implantation masking through photoresist fluorination

Patrick Montgomery, Richard Peters, Cesar Garza, Terry Breeden, Marijean Azrak, Jack Jiang, Kiwoon Kim

Proceedings Volume 6153, 61532Y (2006) https://doi.org/10.1117/12.651047

KEYWORDS: Photoresist materials, Ions, Fluorine, Boron, Ion implantation, Semiconducting wafers, Silicon, Phosphorus, Chemical species, Semiconductors

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Proceedings Article | 14 March 2006 Paper

Using design intent to qualify and control lithography manufacturing

Jim Vasek, Bill Wilkinson, Al Reich, Cesar Garza, Joyce Zhao, Jim Wiley, Moshe Poyastro, Brian Troy, Youval Nehmadi, Zamir Abraham

Proceedings Volume 6156, 61561B (2006) https://doi.org/10.1117/12.656856

KEYWORDS: Lithography, Optical proximity correction, Scanning electron microscopy, Manufacturing, Semiconducting wafers, Electroluminescence, Critical dimension metrology, Control systems, Process control, Resolution enhancement technologies

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Proceedings Article | 4 May 2005 Paper

A novel contact hole shrink process for the 65-nm-node and beyond

Richard Peters, Patrick Montgomery, Cesar Garza, Stanley Filipiak, Tab Stephens, Dan Babbitt

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599918

KEYWORDS: Photoresist processing, Cadmium sulfide, Fluorine, Optical lithography, Thermal effects, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Polymers, Semiconductors

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Proceedings Article | 28 May 2004 Paper

Degradation mechanism and materials for 157-nm pellicles

Cesar Garza, Tom Bierschenk

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533329

KEYWORDS: Fluorine, Atrial fibrillation, Ferroelectric polymers, Pellicles, Hydrogen, Chemical species, Polymers, Infrared spectroscopy, Lithography, Photomasks

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Proceedings Article | 14 May 2004 Paper

Elimination of photoresist linewidth slimming by fluorination

Cesar Garza, Willard Conley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533331

KEYWORDS: Photoresist materials, Fluorine, Scanning electron microscopy, Photoresist processing, Hydrogen, Lithography, Ions, Image processing, Metrology, Time metrology

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Proceedings Article | 12 May 2004 Paper

Reduction of line edge roughness and post resist trim pattern collapse for sub 60 nm gate patterns using gas-phase resist fluorination

Patrick Montgomery, Richard Peters, Cesar Garza, Jonathan Cobb, Bill Darlington, Colita Parker, Stan Filipiak, Danny Babbitt

Proceedings Volume 5753, (2004) https://doi.org/10.1117/12.600785

KEYWORDS: Line edge roughness, Etching, Photoresist processing, Edge roughness, Fluorine, Silicon, Lithography, Yield improvement, Transistors, Scanning electron microscopy

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Proceedings Article | 10 July 2003 Paper

Investigation of product design weaknesses using model-based OPC sensitivity analysis

Sergei Postnikov, Kevin Lucas, Cesar Garza, Karl Wimmer, Patrick LaCour, James Word

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485263

KEYWORDS: Optical proximity correction, Reticles, Error analysis, Semiconducting wafers, Model-based design, Optical lithography, Product engineering, Data modeling, Atrial fibrillation, Lithography

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Proceedings Article | 26 June 2003 Paper

Tool ranking using aberration measurements in a high-volume manufacturing facilility

Cesar Garza, Scott Warrick, Gary Seligman, Lena Zavyalova, Adrian van Zwol, James Foster

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485428

KEYWORDS: Scanning electron microscopy, Scanners, Image processing, Transistors, Manufacturing, Monochromatic aberrations, High volume manufacturing, Optical lithography, Spherical lenses, Semiconductors

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Proceedings Article | 26 June 2003 Paper

Single-write self-aligned rim-phase-shift process

Cesar Garza, Wei Wu, Bernard Roman, Pawitter Mangat, Kevin Nordquist, William Dauksher

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485427

KEYWORDS: Phase shifts, Lithography, Photomasks, Optical lithography, Quartz, Inspection, Etching, Critical dimension metrology, Optical proximity correction, Manufacturing

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 14 September 2001 Paper

The MEEF shall inherit the Earth

Will Conley, Cesar Garza, Mircea Dusa, Robert Socha, Joseph Bendik, Chris Mack

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435725

KEYWORDS: Reticles, Photoresist materials, Photomasks, Critical dimension metrology, Optical proximity correction, Binary data, Lithography, Manufacturing, Lithographic illumination, Coherence (optics)

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Proceedings Article | 14 September 2001 Paper

Ring test aberration determination and device lithography correlation

Cesar Garza, Will Conley, Bernard Roman, Mike Schippers, James Foster, Jan Baselmans, Kevin Cummings, Donis Flagello

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435749

KEYWORDS: Monochromatic aberrations, Scanners, Scanning electron microscopy, Transistors, Lithography, Semiconducting wafers, Deep ultraviolet, Critical dimension metrology, Semiconductors, Phase measurement

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Proceedings Article | 7 June 1996 Paper

Improved method for the automated determination of E0 for lithography SPC

Mark Mason, Robert Soper, Cesar Garza

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240956

KEYWORDS: Semiconducting wafers, Lithography, Process control, Visualization, Photoresist processing, Metrology, Process engineering, Inspection, Optical inspection, Algorithm development

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Proceedings Article | 26 May 1995 Paper

Contact performance with an attenuated phase shift reticle and variable partial coherence

William Krisa, Cesar Garza, Robert Bennett

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209282

KEYWORDS: Reticles, Phase shifts, Semiconducting wafers, Binary data, Photomicroscopy, Silicon, Printing, Logic devices, Wafer testing, Photomasks

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Proceedings Article | 26 May 1995 Paper

0.35-um i-line poly processing with a bottom antireflective coating (BARC)

William Krisa, Cesar Garza, J. McKee

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209291

KEYWORDS: Semiconducting wafers, Etching, Photoresist processing, Reflectivity, Thin films, Critical dimension metrology, Wafer testing, Bottom antireflective coatings, Optical lithography, Thin film coatings

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Proceedings Article | 17 May 1994 Paper

Process optimization for 0.35-um i-line lithography

Cesar Garza, William Krisa, Anthony Yen, Jing Shu

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175458

KEYWORDS: Photoresist processing, Semiconducting wafers, Lithography, Reticles, Photoresist materials, Scanning electron microscopy, Manufacturing, Printing, Reflectivity, Phase shifts

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Proceedings Article | 17 May 1994 Paper

I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles

William Krisa, Cesar Garza, Anthony Yen, Jing Shu

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175456

KEYWORDS: Reticles, Binary data, Photoresist processing, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Etching, Phase shifts, Quartz, Photomicroscopy

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SPIE Journal Paper | 1 October 1993

Benchmark comparison of i-line, alternating phase shift masks

Cesar Garza, Shane Palmer, Jing Shu

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.147129

KEYWORDS: Phase shifts, Reticles, Photomasks, Quartz, Lithography, Manufacturing, Chemical vapor deposition, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

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Proceedings Article | 1 June 1992 Paper

Equipment, materials, and process interactions in a surface-imaging process: part II

Cesar Garza, Eric Solowiej, Mark Boehm

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59740

KEYWORDS: Semiconducting wafers, Photoresist processing, Metals, Plasma, Etching, Image processing, Manufacturing, Magnetism, Materials processing, Particles

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Proceedings Article | 1 June 1992 Paper

Exploring the limits of phase-shift lithography: Part I--the alternating shifter

Shane Palmer, Cesar Garza, Craig Sager, Patrick Reynolds

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130311

KEYWORDS: Photomasks, Information operations, Lithography, Photoresist materials, Optical lithography, Phase shifts, Photoresist processing, Scanning electron microscopy, Photomicroscopy, Reticles

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Proceedings Article | 1 June 1991 Paper

Characterizing a surface imaging process in a high-volume DRAM manufacturing production line

Cesar Garza, David Catlett, Ricky Jackson

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46409

KEYWORDS: Photoresist processing, Manufacturing, Lithography, Semiconducting wafers, Metals, Optical lithography, Image processing, Etching, Oxides, Photomasks

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Proceedings Article | 1 June 1990 Paper

Silicon diffusion characteristics of different surface-imaging resists

George Misium, Monte Douglas, Cesar Garza, Charles Dobson

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20091

KEYWORDS: Diffusion, Silicon, Photoresist processing, Image processing, Head-mounted displays, Etching, Plasma, Scanning electron microscopy, Modulation transfer functions, Optical lithography

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Showing 5 of 24 publications

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