Dr. Chan-Ha Park
Senior Technical Staff at SK Hynix Inc
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Scanners, Lithography, Sensors, Optimization (mathematics), Feedback control

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Overlay metrology, Optical filters, Optical parametric oscillators, 3D metrology, Semiconducting wafers, Near infrared, Photoresist materials, Imaging metrology, Wafer-level optics

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Semiconducting wafers, Metrology, Scanners, Immersion lithography, Critical dimension metrology, Lithography, Lithographic process control

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scatterometry, Wafer-level optics, Manufacturing, Quality measurement, Imaging systems, Scanning electron microscopy, Diffractive optical elements

Showing 5 of 41 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top