Chang-Hwan Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Laser processing, Chromium, Control systems, Photomasks, Logic devices, Optical alignment, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Electron beam lithography, Reticles, Polymethylmethacrylate, Polymers, Chemistry, Photomasks, Extreme ultraviolet lithography, Mask making, Line edge roughness

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Finite-difference time-domain method, Defect detection, Quartz, Dry etching, Inspection, Photomasks, Mask making, Semiconducting wafers, Defect inspection

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Scattering, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Optics manufacturing, Standards development, Phase shifts

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Dry etching, Chromium, Oxygen, Photomasks, Plasma etching, Optical proximity correction, Mask making, Critical dimension metrology, Plasma

Showing 5 of 14 publications
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