Dr. Charles T. Black Profile

Dr. Charles T. Black

Scientist at Brookhaven National Lab

SPIE Involvement:

Author

Proceedings Article | 17 September 2016 Paper

Plasmonic transparent conductors

Andreas Liapis, Matthew Sfeir, Charles Black

Proc. SPIE. 9921, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIV

KEYWORDS: Plasmonics, Surface plasmons, Nanostructuring, Metals, Glasses, Interfaces, Silver, Resistance, Transmittance, Transparent conductors

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Proceedings Article | 4 June 2014 Paper

Block copolymer self assembly for design and vapor phase synthesis of one-dimensional nanostructured materials

A Rahman, C. Black

Proc. SPIE. 9083, Micro- and Nanotechnology Sensors, Systems, and Applications VI

KEYWORDS: Thin films, Nanostructures, Nanostructuring, Polymethylmethacrylate, Polymers, Metals, Germanium, Silicon, Reflectivity, Nanowires

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SPIE Journal Paper | 24 July 2012

Plasma etch transfer of self-assembled polymer patterns

Danvers Johnston, Ming Lu, Charles Black

JM3 Vol. 11 Issue 3

KEYWORDS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Polymethylmethacrylate, Scanning electron microscopy, Thin films, Reactive ion etching

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Proceedings Article | 17 March 2012 Paper

Plasma etch transfer of self-assembled polymer patterns

Danvers Johnston, Ming Lu, Charles Black

Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning

KEYWORDS: Thin films, Optical lithography, Polymethylmethacrylate, Etching, Polymers, Image processing, Silicon, Oxygen, Plasma etching, Plasma

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SPIE Journal Paper | 14 March 2012

Implementing nanometer-scale confinement in organic semiconductor bulk heterojunction solar cells

Jonathan Allen, Kevin Yager, Chang-Yong Nam, Charles Black, Htay Hlaing, Benjamin Ocko

JPE Vol. 2 Issue 1

KEYWORDS: Solar cells, Heterojunctions, Organic semiconductors, Annealing, Aluminum, Scattering, Organic photovoltaics, Polymethylmethacrylate, Scanning electron microscopy, Etching

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Proceedings Article | 20 March 2008 Paper

Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid

Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Ricardo Ruiz, Charles Black, Jed Pitera, Charles Rettner, Myron Flickner

Proc. SPIE. 6921, Emerging Lithographic Technologies XII

KEYWORDS: Oxides, Lithography, Silicon, Coating, Chromium, Scanning electron microscopy, Directed self assembly, Plasma etching, Picosecond phenomena, Photomicroscopy

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Proceedings Article | 13 March 2006 Paper

Self assembly in semiconductor microelectronics: self-aligned sub-lithographic patterning using diblock copolymer thin films

C. T. Black, R. Ruiz

Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII

KEYWORDS: Semiconductors, Thin films, Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Image processing, Scanning electron microscopy, Picosecond phenomena, Chemical elements

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Proceedings Article | 12 June 2003 Paper

Does line-edge roughness matter?: FEOL and BEOL perspectives

Qinghuang Lin, Charles Black, Christophe Detavernier, Lynne Gignac, Kathryn Guarini, Brian Herbst, Hyungjun Kim, Philip Oldiges, Karen Petrillo, Martha Sanchez

Proc. SPIE. 5039, Advances in Resist Technology and Processing XX

KEYWORDS: Copper, Silicon, Surface roughness, Atomic layer deposition, Transistors, Line edge roughness, Tantalum, Plasma, Back end of line, Front end of line

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Proceedings Article | 1 May 1997 Paper

Demonstration of a nanolithographic system using a self-assembled monolayer resist for neutral atomic cesium

Rebecca Younkin, Karl Berggren, Eunice Cheung, Kent Johnson, Mara Goff Prentiss, Andrew Black, George Whitesides, D. Ralph, Charles Black, Michael Tinkham

Proc. SPIE. 2995, Atom Optics

KEYWORDS: Gold, Lithography, Optical lithography, Silica, Etching, Chemical species, Silicon, Photomasks, Cesium, Self-assembled monolayers

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Proceedings Article | 1 May 1997 Paper

Using neutral metastable argon atoms and contamination lithography to form nanostructures in silicon, silicon dioxide, and gold

Kent Johnson, Karl Berggren, Andrew Black, Charles Black, Arthur Chu, Nynke Dekker, D. Ralph, Joseph Thywissen, Rebecca Younkin, Mara Goff Prentiss, Michael Tinkham, George Whitesides

Proc. SPIE. 2995, Atom Optics

KEYWORDS: Gold, Lithography, Silica, Etching, Argon, Chemical species, Silicon, Photomasks, Wet etching, Photoresist processing

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Showing 5 of 10 publications

Conference Committee Involvement (1)

Advanced Etch Technology for Nanopatterning III

24 February 2014 | San Jose, California, United States

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