Dr. Charles H. Fields Profile

Dr. Charles H. Fields

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 3 August 2004 Paper

Ultrahigh-speed photonic analog-to-digital conversion technologies

Willie Ng, L. Luh, David Persechini, D. Le, Y. So, Mehran Mokhtari, Charles Fields, Daniel Yap, John Jensen

Proceedings Volume 5435, (2004) https://doi.org/10.1117/12.548220

KEYWORDS: Mode locking, Modulators, Analog electronics, Oscillators, Photodetectors, Picosecond phenomena, Photonic integrated circuits, Signal to noise ratio, Clocks, Fiber lasers

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure

Nicholas Rau, Andrew Neureuther, Taro Ogawa, Randall Kubena, Fred Stratton, Charles Fields, C. Grant Willson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312465

KEYWORDS: Ion beams, Diffusion, Lithography, Scanning electron microscopy, Image quality, Optical lithography, Deep ultraviolet, Photoresist materials, Ions, Photoresist developing

Read Abstract +

Proceedings Article | 7 July 1997 Paper

Measurement of midspatial frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements

Charles Fields, Avijit Ray-Chaudhuri, Kevin Krenz, William Oldham, Richard Stulen

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275798

KEYWORDS: Modulation transfer functions, Extreme ultraviolet lithography, Spatial frequencies, Imaging systems, Surface roughness, Extreme ultraviolet, Cameras, Coherence (optics), Light scattering, Convolution

Read Abstract +

Proceedings Article | 17 May 1994 Paper

Analyzing deep-UV lens aberrations using aerial image and latent image metrologies

Eric Raab, Christophe Pierrat, Charles Fields, Robert Kostelak, William Oldham, Sheila Vaidya

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175450

KEYWORDS: Semiconducting wafers, Monochromatic aberrations, Metrology, Deep ultraviolet, Reticles, Photoresist processing, Quartz, Image processing, Lithography, Sensors

Read Abstract +

Proceedings Article | 17 May 1994 Paper

Aerial image measurements on a commercial stepper

Charles Fields, William Partlo, William Oldham

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175453

KEYWORDS: Sensors, Image sensors, Deep ultraviolet, Image processing, Monochromatic aberrations, Scanning electron microscopy, Amorphous silicon, Photoresist processing, Photoresist materials, Optical lithography

Read Abstract +

Proceedings Article | 8 August 1993 Paper

Use of amorphous silicon for deep-UV masks

Charles Fields, William Oldham, Richard Bojko

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150467

KEYWORDS: Amorphous silicon, Photomasks, Semiconducting wafers, Deep ultraviolet, Absorption, Silicon, Chromium, Etching, Optical properties, Optical lithography

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years