Mr. Charles H. Howard Profile

Charles H. Howard

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Publications (9)

Proceedings Article | 28 June 2005 Paper

Second level printing of advanced phase shift masks using DUV laser lithography

Charles Howard, Keun-Taek Park, Marcus Scherer, Svetomir Stankovic, Rusty Cantrell, Mark Herrmann

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617357

KEYWORDS: Monte Carlo methods, Photomasks, Error analysis, Deep ultraviolet, Printing, Overlay metrology, Phase shifts, Lithography, Optical alignment, Neodymium

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Proceedings Article | 20 August 2004 Paper

Imaging properties of a leading-edge DUV laser generated photomask

Curt Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Jason Hickethier, Charles Howard, Robert Kiefer, Matt Lamantia, John Manfredo, James Tsou

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557720

KEYWORDS: Deep ultraviolet, Photomasks, Lithography, Semiconducting wafers, Manufacturing, Lithographic illumination, Electron beam lithography, Solids, Tolerancing, Vestigial sideband modulation

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Proceedings Article | 28 May 2004 Paper

DUV laser lithography for photomask fabrication

Curt Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Charles Howard, Robert Kiefer, John Manfredo, James Tsou

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534575

KEYWORDS: Deep ultraviolet, Photomasks, Lithography, Manufacturing, Thin film coatings, Vestigial sideband modulation, Critical dimension metrology, Photoresist processing, Image enhancement, Printing

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Proceedings Article | 17 December 2003 Paper

DUV laser lithography for photomask fabrication

Curt Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Charles Howard, Robert Kiefer, John Manfredo, James Tsou

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518269

KEYWORDS: Deep ultraviolet, Photomasks, Lithography, Manufacturing, Thin film coatings, Vestigial sideband modulation, Photoresist processing, Critical dimension metrology, Inspection, Printing

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Proceedings Article | 27 December 2002 Paper

Partitioning of photomask processes for defects: II.

Charles Howard, Matthew Lamantia

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467855

KEYWORDS: Inspection, Etching, Photomasks, Reticles, Deep ultraviolet, Plasma etching, Chemically amplified resists, Electron beams, Plasma, Photoresist processing

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Proceedings Article | 11 March 2002 Paper

Partitioning of photomask processes for defects

Charles Howard, Russell Shoemake, Phillip Lim, Curt Linder

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458318

KEYWORDS: Inspection, Etching, Thulium, Photomasks, Scanning electron microscopy, Calibration, Reflectivity, Defect inspection, Manufacturing, Dry etching

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Proceedings Article | 22 January 2001 Paper

Using manufacturing rule check to prescreen reticle inspection databases

Charles Howard, Paul DePesa, Curt Linder

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410684

KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Optical proximity correction, Databases, Computed tomography, Standards development, Binary data, Lithography

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Proceedings Article | 19 July 2000 Paper

Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability

Jerry Chen, Charles Howard, Kong Son, Franklin Kalk, Il-Ho Lee

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392032

KEYWORDS: Inspection, Standards development, Manufacturing, Photomasks, Scanning electron microscopy, Environmental sensing, Cadmium sulfide, Chromium, Optical proximity correction, Semiconductors

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Proceedings Article | 24 July 1996 Paper

Detection and printability of random and programmed pinholes on Cr photomasks

Franklin Kalk, Anthony Vacca, Charles Howard, Linard Karklin

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245244

KEYWORDS: Lithium, Inspection, Photomasks, Chromium, Defect detection, Reflectivity, Databases, Calibration, Laser scattering, Distortion

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Showing 5 of 9 publications

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