Dr. Charles J. Neef
Scientist at Brewer Science Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Etching, Silicon, Chemistry, Photoresist materials, Silicon films, Epoxies, Silicon carbide, Semiconducting wafers

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Lithography, Titanium, Etching, Crystals, Silicon, Chemistry, Photoresist materials, Semiconducting wafers, Temperature metrology

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Multilayers, Etching, Silicon, Reflectivity, Photomasks, Plasma etching, Semiconducting wafers, System on a chip, Plasma

Proceedings Article | 30 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Argon, Silicon, Reflectivity, Chromophores, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Photoresist developing, Temperature metrology

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Image processing, Coating, Materials processing, Scanning electron microscopy, Photoresist materials, Plasma etching, Semiconducting wafers, Chemical mechanical planarization

Showing 5 of 8 publications
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