This paper describes design methodologies developed for silicon photonics integrated circuits. The approach presented is inspired by methods employed in the Electronics Design Automation (EDA) community. This is complemented by well established photonic component design tools, compact model synthesis, and optical circuit modelling. A generic silicon photonics design kit, as described here, is available for download at http://www.siepic.ubc.ca/GSiP.
A universal design methodology for grating couplers based on the silicon-on-insultator platform is presented in this paper. Our design methodology accomodates various etch depths, silicon thickness (e.g., 220 nm, 300 nm), incident angles, and cladding materials (e.g., silicon oxide or air), and has been verified by simulations and measurement results. Further more, the design methodology presented can be applied to a wide range, from 1260 nm to 1675 nm, of wavelengths.
Development of large-scale photonic integrated circuits requires an accurate, simple, and space-efficient method for characterizing the optical losses of integrated optical components. Here we present a ring-resonator-based technique for transmission-loss measurement of integrated optical components. Y-branch splitters are used to demonstrate the concept. This measurement techique is based on characterizing the spectral response of a waveguide ring resonator with a number of Y-branches inserted inside the cavity. The measurement accuracy is intrinsically limited by the optical loss of the ring waveguide and is independent of fiber-to-waveguide coupling losses. The devices were fabricated using a CMOS-compatible silicon-on-insulator technology. Our results show that the proposed technique is promising for high-accuracy, high-efficiency characterization of optical losses. Limitations of and potential improvements to the technique are also discussed.
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