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Cheng-He Li
at Semiconductor Manufacturing International Corp
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Publications (4)
Proceedings Article | 25 September 2010 Paper
An optimized OPC and MDP flow for reducing mask write time and mask cost
Proceedings Volume 7823, 78233E (2010) https://doi.org/10.1117/12.864790
KEYWORDS: Optical proximity correction, Photomasks, Logic, Metals, Resolution enhancement technologies, Model-based design, Semiconducting wafers, Optical lithography, Databases, Logic devices
Proceedings Article | 16 March 2009 Paper
Model-based retarget for 45nm node and beyond
Proceedings Volume 7274, 727428 (2009) https://doi.org/10.1117/12.814085
KEYWORDS: Optical proximity correction, Model-based design, Process modeling, Design for manufacturing, Manufacturing, Optical lithography, Design for manufacturability, Calibration, Semiconductors, Lithography
Proceedings Article | 13 March 2009 Paper
Model-based adaptive fragmentation
Proceedings Volume 7275, 72751I (2009) https://doi.org/10.1117/12.814833
KEYWORDS: Model-based design, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Visualization, Optical properties, Integrated optics, Image compression, Distortion, Design for manufacturability
Proceedings Article | 7 March 2008 Paper
OPC optimization for double dipole lithography and its application on 45nm node with dry exposure
Se-Jin Park, Jae-Kyung Seo, ChengHe Li, Daisy Liu, Petros An, Xiao-Hui Kang, Eric Guo
Proceedings Volume 6924, 69243O (2008) https://doi.org/10.1117/12.773290
KEYWORDS: SRAF, Photomasks, Optical proximity correction, Lithography, Semiconducting wafers, Phase shifts, Lithographic illumination, Metals, Scanners, Logic
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