Dr. Cheng-ming Lin Profile

Dr. Cheng-ming Lin

Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd

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Publications (4)

Proceedings Article | 28 August 2003 Paper

Photomask defect tracing, analysis, and reduction with chemically amplified resist process

Cheng-ming Lin, Rick Lai, W. Huang, B. Wang, C. Chen, C. Kung, Chue-San Yoo, Jieh-Jang Chen, Sheng-Cha Lee

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504189

KEYWORDS: Inspection, Particles, Scanning electron microscopy, Chromium, Atomic force microscopy, Dry etching, Photomasks, Contamination, Photoresist processing, Optical proximity correction

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Proceedings Article | 1 August 2002 Paper

Application of AlSi-based materials on approach of chemical stability of embedded layer for bilayer attenuated phase-shifting mask in 193-nm lithography

Cheng-Ming Lin, Wen-An Loong

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476985

KEYWORDS: Aluminum, Silicon, Optical properties, Argon, Aluminum nitride, Transmittance, Sputter deposition, Phase shifts, Photomasks, Lithography

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Proceedings Article | 1 August 2002 Paper

Simulation of transmittance on the effect of resolution enhancement of 100-nm pattern with attenuated phase-shifting mask in 193-nm lithography

Cheng-Ming Lin

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476986

KEYWORDS: Transmittance, Photomasks, Image resolution, Phase shifts, Resolution enhancement technologies, Image transmission, Lithography, Image enhancement, Lithographic illumination, Scattering

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Proceedings Article | 26 July 1999 Paper

Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm

Cheng-ming Lin, Keh-wen Chang, Ming-der Lee, Wen-An Loong

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354320

KEYWORDS: Etching, Sputter deposition, Phase shifts, Optical properties, Chemical analysis, Plasma, Silica, Photomasks, Low pressure chemical vapor deposition, Palladium

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