Mr. Cheng-Huei Lin Profile

Cheng-Huei Lin

at ASML Brion

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Publications (1)

Proceedings Article | 20 March 2018 Paper

OPC model accuracy enhancement for asymmetrical layouts by incorporating 2D contour extraction methodology

Cheng-Huei Lin, Che-Ming Hu, Fred Lo, Elvis Yang, Ta-Hone Yang, K.C. Chen

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Data modeling, Calibration, Image segmentation, 3D modeling, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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