Cheng-Huei Lin
at ASML Brion
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Data modeling, Calibration, Image segmentation, 3D modeling, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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