Chi-Hong Tung
at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 21 September 2007 Paper
Proceedings Volume 6672, 66720S (2007) https://doi.org/10.1117/12.731429
KEYWORDS: Phase shifts, Beam splitters, Phase interferometry, Interferometry, Interferometers, Error analysis, Profiling, Diffraction, Reliability, 3D metrology

Proceedings Article | 11 September 2007 Paper
Proceedings Volume 6672, 667204 (2007) https://doi.org/10.1117/12.733625
KEYWORDS: Beam splitters, Interferometers, Interferometry, Calibration, Charge-coupled devices, Light sources, Actuators, Image processing, 3D metrology, LCDs

Proceedings Article | 5 April 2007 Paper
Y. S. Ku, C. H. Tung, Y. P. Li, H. L. Pang, C. M. Ke, Y. H. Wang, D. C. Huang, N. P. Smith, L. Binns
Proceedings Volume 6518, 65182V (2007) https://doi.org/10.1117/12.713075
KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Data modeling, Mathematical modeling, Wafer testing, Reticles, Tolerancing, Error analysis, Process control

Proceedings Article | 14 August 2006 Paper
Proceedings Volume 6292, 62921F (2006) https://doi.org/10.1117/12.678899
KEYWORDS: Interferometry, Beam splitters, Light sources, Optical filters, Error analysis, Time metrology, Profiling, Mirrors, Objectives, Charge-coupled devices

Proceedings Article | 24 March 2006 Paper
Y. Ku, C. Tung, Y. Li, H. Pang, N. Smith, L. Binns, T. Rigden, G. Reynolds, H. Fink
Proceedings Volume 6152, 615214 (2006) https://doi.org/10.1117/12.655953
KEYWORDS: Overlay metrology, Data modeling, Scanning electron microscopy, Image processing, Process control, Image resolution, Semiconducting wafers, Tolerancing, Lithography, Image acquisition

Showing 5 of 9 publications
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