Dr. Chi-Min Yuan
Senior staff at NXP Semiconductors
SPIE Involvement:
Conference Program Committee | Editor | Author | Instructor
Area of Expertise:
design for manufacturing , optical proximity correction , photomask research and development , lithography process and modeling , mask preparation , photomask marketing and sales
Publications (23)

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11614, 1161402 (2021) https://doi.org/10.1117/12.2592873

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11614, 116140K (2021) https://doi.org/10.1117/12.2583827
KEYWORDS: Reliability, Dielectrics, System on a chip, Semiconductors, Metals, Electrical breakdown

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11328, 113280Q (2020) https://doi.org/10.1117/12.2548637
KEYWORDS: Antennas, Diodes, Manufacturing, Oxides, System on a chip, Plasma, Metals, Reliability, Resistance, Semiconductors

Proceedings Article | 28 March 2014 Paper
Chimin Yuan, Dave Tipple, Jeff Warner
Proceedings Volume 9053, 90530O (2014) https://doi.org/10.1117/12.2045660
KEYWORDS: Transistors, Reliability, System on a chip, Semiconductors, Temperature metrology, Capacitance, Metals, Optical proximity correction, Oxides, Copper

Proceedings Article | 15 March 2012 Paper
Proceedings Volume 8327, 83270E (2012) https://doi.org/10.1117/12.917447
KEYWORDS: Metals, Digital electronics, Design for manufacturing, Logic, Analog electronics, Lithography, Neodymium, Clocks, Transistors, Ions

Showing 5 of 23 publications
Proceedings Volume Editor (4)

Conference Committee Involvement (13)
DTCO and Computational Patterning III
26 February 2024 | San Jose, California, United States
DTCO and Computational Patterning II
27 February 2023 | San Jose, California, United States
DTCO and Computational Patterning
26 April 2022 | San Jose, California, United States
Design-Technology Co-optimization XV
22 February 2021 | Online Only, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIV
26 February 2020 | San Jose, California, United States
Showing 5 of 13 Conference Committees
Course Instructor
SC1030: Interaction of Physical Design and Lithography
This course provides attendees with a basic knowledge of physical design and its interaction with lithography. Physical design covers a sequence of steps from logic synthesis, power planning, clock tree synthesis, placement, routing, timing closure, cell library creation and technology library creation. Each step has an impact on circuit layout and lithographic patterning. This is especially true when multiple patterning technology began to be adopted at 20nm and below. Based on the feedback of course attendees from previous years, we restrict the primary scope of physical design to four key topics- standard cells, placement, routing and timing closure, that are most relevant to lithographers. In this course, we will devote approximately 2/3 of the time to introducing the concept of physical design, and 1/3 of the time on its interaction with lithography. Also, the instructor will try to cover the physical design aspects relevant to the DPTCO papers to be presented in the conference later in the week.
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