Chia Wei Huang
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Visualization, Databases, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Electronic design automation

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Data modeling, Sensors, Calibration, Finite element methods, Optical proximity correction, Semiconducting wafers, Tolerancing, Process modeling

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Feature extraction, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Image processing, Resistance, Photomasks, Transistors, Integrated circuits, Semiconducting wafers, Integrated circuit design, Overlay metrology, Classification systems

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