Dr. Chia-Yun Hsieh Profile

Dr. Chia-Yun Hsieh

at Air Liquide Electronics

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 6 April 2020 Presentation + Paper

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee, Brendan O’Brien, Luciana Meli, Chi Chun Liu, Saumya Sharma, Karen Petrillo, Cody Murray, Eric Liu, Katie Lutker-Lee, Qiaowei Lou, Chris Cole, Angélique Raley, Akiteru Ko, Subhadeep Kal, Jake Kaminsky, Aelan Mosden, Henan Zhang, Shan Hu, Lior Huli, Naoki Shibata, Dave Hetzer, Chia-Yun (Sharon) Hsieh

Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727

KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

Read Abstract +

Proceedings Article | 29 March 2019 Paper

Line roughness improvements on EUV 36nm pitch pattern by plasma treatment method

Toshiharu Wada, Chia-Yun Hsieh, Akiteru Ko, Peter Biolsi

Proceedings Volume 10963, 109630I (2019) https://doi.org/10.1117/12.2514764

KEYWORDS: Extreme ultraviolet, Plasma treatment, Line width roughness, Line edge roughness, Photoresist materials, Integrated circuits, Immersion lithography, 193nm lithography, Lithography, Lead

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years