Dr. Chih Tsung Shih Profile

Dr. Chih Tsung Shih

at TSMC

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Author

Publications (4)

Proceedings Article | 19 March 2015 Paper

An accurate method to determine the amount of out-of-band light in an EUV scanner

Shinn-Sheng Yu, Yen-Cheng Lu, Chih-Tsung Shih, Chia-Chun Chung, Shang-Chieh Chien, Shun-Der Wu, Norman Chen, Shu-Hao Chang, Hsiang-Yu Chou, Jui-Ching Wu, Tao-Ming Huang, Jack J. H. Chen, Anthony Yen

Proceedings Volume 9422, 94221T (2015) https://doi.org/10.1117/12.2085089

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Optical proximity correction, Reflectivity, Aluminum, Line width roughness, Light, Scanners, Light sources

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Proceedings Article | 13 March 2015 Paper

Mitigation of image contrast loss due to mask-side non-telecentricity in an EUV scanner

Chih-Tsung Shih, Shinn-Sheng Yu, Yen-Cheng Lu, Chia-Chun Chung, Jack J. H. Chen, Anthony Yen

Proceedings Volume 9422, 94220Y (2015) https://doi.org/10.1117/12.2085092

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Electroluminescence, Scanners, Lithography, Reflectivity, Extreme ultraviolet, Chromium, Resolution enhancement technologies

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Proceedings Article | 1 April 2013 Paper

Limitation of OAI + AttPSM in EUVL

Shinn-Sheng Yu, Yen-Cheng Lu, Chih-Tsung Shih, Jack J. Chen, Anthony Yen

Proceedings Volume 8679, 86791L (2013) https://doi.org/10.1117/12.2010943

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Electroluminescence, Lithographic illumination, Signal attenuation, Diffraction, Phase shifts, Extreme ultraviolet, Image enhancement, Projection systems

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Proceedings Article | 23 March 2012 Paper

The role resist plays in EUVL extensibility

Shinn-Sheng Yu, Anthony Yen, Chih-T'sung Shih, Yen-Cheng Lu, Shu-Hao Chang, Jui-Ching Wu, Jimmy Hu, Timothy Wu

Proceedings Volume 8322, 83222A (2012) https://doi.org/10.1117/12.916024

KEYWORDS: Extreme ultraviolet lithography, Electroluminescence, Diffusion, Lithography, Extreme ultraviolet, Modulation transfer functions, Nanoimprint lithography, Performance modeling, Photomasks, Image resolution

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