Chin-Cheng Yang
Manager at Macronix International Co Ltd
SPIE Involvement:
Publications (14)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Detection and tracking algorithms, Etching, Inspection, Optical testing, Optical metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical lithography, Defect detection, Etching, Image processing, Scanners, Diffusion, Distortion, Scanning electron microscopy, Process control, Compact discs, Critical dimension metrology, Semiconducting wafers, Temperature metrology

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Reticles, Optical lithography, Modulation, Photomasks, SRAF, Critical dimension metrology, Imaging arrays, Semiconducting wafers, Array processing

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Image processing, Manufacturing, Electroluminescence, Photomasks, Immersion lithography, Source mask optimization, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Etching, Satellites, Polymers, Distortion, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers, Defect inspection

Showing 5 of 14 publications
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