Dr. Chin-Yu Ku Profile

Dr. Chin-Yu Ku

Manager at Vanguard Intl Semicon Corp

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Author

Publications (7)

Proceedings Article | 14 May 2004 Paper

Effect of PEB exhaust on resist CD for DUV process

Shu-Fen Tsai, Yuh-Shyang Chiu, Chih-Horng Chien, Hann-Yii Gao, Chin-Yu Ku

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534486

KEYWORDS: Critical dimension metrology, Deep ultraviolet, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Phase modulation, Calibration, Photomasks, Electron microscopes, Semiconductors

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Proceedings Article | 14 May 2004 Paper

Microlens-induced pattern defect in DUV resist

Shu-Fen Tsai, Chih-You Chen, Chih-Chuan Chang, Tai-Wei Huang, Hann-Yii Gao, Chin-Yu Ku

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534482

KEYWORDS: Particles, Semiconducting wafers, Photomasks, Coating, Deep ultraviolet, Scanning electron microscopy, Optical lithography, Binary data, Phase shifts, Photoresist processing

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Proceedings Article | 12 June 2003 Paper

Post soft-bake delay effect on CD variation in DUV resist

Shu-Fen Tsai, Chih-You Chen, King-Terk Chan, Hann-Yii Gao, Chin-Yu Ku

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485092

KEYWORDS: Semiconducting wafers, Head-mounted displays, Critical dimension metrology, Scanning electron microscopy, Deep ultraviolet, Photoresist processing, Coating, Bottom antireflective coatings, Semiconductors, Thin film coatings

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Proceedings Article | 24 July 2002 Paper

Method to improve the throughput and retain the CD performance for DUV process

Yung-Tsung Hsiao, Ta-Chung Liu, Lee-Jean Chiu, Chih-You Chen, Chin-Yu Ku

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474271

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Deep ultraviolet, Photoresist materials, Photoresist processing, Temperature metrology, Automatic control, Electroluminescence, Signal processing, Lithography

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Proceedings Article | 16 July 2002 Paper

New clear-out scheme to improve the overlay performance for a CMP process

Yao-Wen Guo, Han-Pin Kao, Tsung-Chih Chien, Chiafu Chang, Hsin-Sung Lin, Yen-Fen Chen, Chin-Yu Ku

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473432

KEYWORDS: Oxides, Chemical mechanical planarization, Semiconducting wafers, Optical alignment, Phase modulation, Chlorine, Overlay metrology, Etching, Scanning electron microscopy, Transmission electron microscopy

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Proceedings Article | 23 August 2000 Paper

New overlay pattern design for real-time focus and tilt monitor

Chin-Yu Ku, Tan Lei, Jia-Min Shieh, Tsann-Bim Chiou, Hwang-Kuen Lin

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410087

KEYWORDS: Overlay metrology, Semiconducting wafers, Lithography, Photomasks, Monochromatic aberrations, Scanning electron microscopy, Finite element methods, Process control, Photoresist materials, Binary data

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Proceedings Article | 23 August 2000 Paper

Real-time process control to prevent CD variation induced by postexposure delay

Chin-Yu Ku, Tan Lei, Jia-Min Shieh, Tsann-Bim Chiou, Yung-Cheng Chen

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410094

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Automatic control, Process control, Deep ultraviolet, Scanning electron microscopy, Diffusion, Image processing, Signal processing, Control systems

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Showing 5 of 7 publications

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