Mr. Chin Le Profile

Chin Le

Principal Engineer at Micron Technology Inc

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Author

Publications (3)

Proceedings Article | 27 May 2009 Paper

Nuisance event reduction using sensitivity control layers (SCL) for advanced photomask inspection

Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venugopal Vellanki, Jeff McMurran

Proceedings Volume 7470, 74700U (2009) https://doi.org/10.1117/12.835192

KEYWORDS: Inspection, Photomasks, Databases, SRAF, Optical proximity correction, Semiconducting wafers, Reticles, Defect detection, Feature extraction, Opacity

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Proceedings Article | 17 October 2008 Paper

Novel mask inspection flow using Sensitivity Control Layers (SCL) on the TeraScanHR-587 platform

Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venu Vellanki, Jeff McMurran

Proceedings Volume 7122, 71221G (2008) https://doi.org/10.1117/12.801480

KEYWORDS: Inspection, Databases, Photomasks, SRAF, Optical proximity correction, Semiconducting wafers, Reticles, Defect detection, Feature extraction, Opacity

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Proceedings Article | 5 November 2005 Paper

Improved file sizes and cycle times through optimization of GDSII stream

Chin Le, David Gariepy

Proceedings Volume 5992, 599213 (2005) https://doi.org/10.1117/12.631780

KEYWORDS: Optical proximity correction, Chemical mechanical planarization, Resolution enhancement technologies, Optimization (mathematics), Manufacturing, Photomask technology, Ranging, System on a chip, Analog electronics

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