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Chisaki Takubo
at Hitachi Ltd
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Publications (1)
Proceedings Article | 10 April 2024 Poster
Three-dimensional global uniformity control in plasma etcher using multi parameter profile characterization technique based on CD-SEM image
Makoto Satake, Chisaki Takubo, Tadashi Okumura, Kenji Yasui, Hitoshi Namai, Takahiro Kawasaki, Mayuka Osaki, Maki Tanaka
Proceedings Volume 12955, 129553K (2024) https://doi.org/10.1117/12.3011778
KEYWORDS: Plasma etching, Plasma, 3D image processing, Semiconducting wafers, Critical dimension metrology, Control systems, Temperature control, Semiconductors, Gallium arsenide, Field effect transistors
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