Dr. Chris H. Clifford
Staff Software Development Engineer at Siemens
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Area of Expertise:
Computational Lithography
Websites:
Profile Summary

I am working as a developer in the Calibre division at Siemens ( formerly Mentor Graphics ) in Fremont, CA.
Publications (31)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Logic, Visualization, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Failure analysis, Stochastic processes

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Scanners, Error analysis, Manufacturing, Wavefronts, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Tolerancing

Proceedings Article | 16 October 2017 Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Wafer-level optics, Finite-difference time-domain method, Scanners, Projection systems, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Electromagnetism, Systems modeling

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Showing 5 of 31 publications
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