Dr. Chris A. Mack
CTO at Fractilia LLC
SPIE Involvement:
Author | Instructor | Visiting Lecturer
Area of Expertise:
Photolithography , Modeling , Microlithography , Stochastic Modeling
Websites:
Profile Summary

Chris A. Mack received Bachelor of Science degrees in physics, chemistry, electrical engineering, and chemical engineering from Rose-Hulman Institute of Technology in 1982, a Master of Science degree in electrical engineering from the University of Maryland in 1989, and a Ph.D. in chemical engineering from the University of Texas at Austin in 1998. Mr. Mack founded FINLE Technologies, the developer of the lithography simulation software PROLITH, in 1990, serving as President and Chief Technical Officer until the acquisition of FINLE by KLA-Tencor in 2000. For the next five years he served as Vice President of Lithography Technology for KLA-Tencor. In 2003 he received the SEMI Award for North America for his efforts in lithography simulation and education. He became a fellow of SPIE in 2006, and a fellow of IEEE in 2010. In 2009 he received the SPIE Frits Zernike Award for Microlithography. He is also an adjunct faculty member at the University of Texas at Austin and spent the Fall 2006 semester as a visiting professor at the University of Notre Dame. He has recently completed a comprehensive graduate-level textbook on optical lithography, Fundamental Principles of Optical Lithography, published in late 2007. In 2012 he became Editor-In-Chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3). In 2017 he cofounded Fractilia, where he now works as Chief Technical Officer developing metrology solutions for the measurement of roughness.
Publications (219)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Lithography, Edge detection, Metrology, Optical lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 28 April 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Optical lithography, Etching, Annealing, Materials processing, Scanning electron microscopy, Line width roughness, Directed self assembly, Picosecond phenomena, Line edge roughness, Temperature metrology