Dr. Christopher D. Sheraw
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295305 (2024) https://doi.org/10.1117/12.3012023
KEYWORDS: Line width roughness, Light sources and illumination, Nanoimprint lithography, Optical lithography, Line edge roughness, Etching, Transistors, Extreme ultraviolet, Reactive ion etching, Extreme ultraviolet lithography

Proceedings Article | 29 March 2006 Paper
Sean Burns, Dirk Pfeiffer, Arpan Mahorowala, Karen Petrillo, Alexandera Clancy, Katherina Babich, David Medeiros, Scott Allen, Steven Holmes, Michael Crouse, Colin Brodsky, Victor Pham, Yi-Hsiung Lin, Kaushal Patel, Naftali Lustig, Allen Gabor, Christopher Sheraw, Phillip Brock, Carl Larson
Proceedings Volume 6153, 61530K (2006) https://doi.org/10.1117/12.657197
KEYWORDS: Silicon, Reflectivity, Etching, Photoresist materials, Polymers, Lithography, Oxides, Silicon films, Reactive ion etching, Optical lithography

Proceedings Article | 21 December 2001 Paper
David Gundlach, Chung-Chen Kuo, Chris Sheraw, Jonathan Nichols, Thomas Jackson
Proceedings Volume 4466, (2001) https://doi.org/10.1117/12.451466
KEYWORDS: Dielectrics, Silicon, Silica, Silicon films, Thin films, Organic semiconductors, Transistors, Electronics, Atomic force microscopy, Polymers

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