Dr. Chris Summitt Profile

Dr. Chris Summitt

Senior Optical Engineer at Nikon Research Corporation of America

SPIE Involvement:

Author

Area of Expertise:

photography , lithography

Publications (7)

Proceedings Article | 27 November 2017 Paper

3D visualization of optical ray aberration and its broadcasting to smartphones by ray aberration generator

Brandon Hellman, Erica Bosset, Luke Ender, Naveed Jafari, Phillip McCann, Chris Nguyen, Chris Summitt, Sunglin Wang, Yuzuru Takashima

Proceedings Volume 10590, 105900D (2017) https://doi.org/10.1117/12.2288143

KEYWORDS: Geometrical optics, 3D visualizations, Visualization, Aberration theory

Read Abstract +

Proceedings Article | 20 August 2015 Presentation + Paper

All-polymer based fabrication process for an all-polymer flexible and parallel optical interconnect

Jilin Yang, Tao Ge, Chris Summitt, Sunglin Wang, Tom Milster, Yuzuru Takashima

Proceedings Volume 9556, 95560F (2015) https://doi.org/10.1117/12.2187143

KEYWORDS: Waveguides, Imaging systems, Mirrors, Optical alignment, Phase contrast, Microscopy, Photomasks, Semiconducting wafers, Optical interconnects, Objectives

Read Abstract +

Proceedings Article | 17 April 2015 Paper

Process optimization for a 3D optical coupler and waveguide fabrication on a single substrate using buffer coat material

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 937415 (2015) https://doi.org/10.1117/12.2080425

KEYWORDS: Waveguides, Mirrors, Photomasks, Optical alignment, Thin film coatings, Lithography, Cladding, Integrated optics, Silicon, Chromium

Read Abstract +

Proceedings Article | 13 March 2015 Paper

High contrast and metal-less alignment process for all-polymer optical interconnect devices

Tao Ge, Jilin Yang, Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 93741F (2015) https://doi.org/10.1117/12.2079620

KEYWORDS: Imaging systems, Phase contrast, Optical alignment, Mirrors, Polymers, Lithography, Optical interconnects, Waveguides, Microscopes, Objectives

Read Abstract +

Proceedings Article | 15 September 2014 Paper

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Sunglin Wang, Chris Summitt, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9170, 91700F (2014) https://doi.org/10.1117/12.2062414

KEYWORDS: Mirrors, Lithography, Interferometers, Scanning electron microscopy, Surface roughness, Objectives, Optical fabrication, Thin film coatings, Waveguides, Profilometers

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years