Christian Buergel
Senior Member of Technical Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Area of Expertise:
Electron beam patterning , Resist processing , Mask process corrections
Publications (24)

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Critical dimension metrology, Machine learning, Photomasks, Etching, Scanning electron microscopy, Convolution, Semiconductors, Quality measurement, Environmental sensing, Manufacturing

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Machine learning, Data modeling, Critical dimension metrology, Performance modeling, Process control, Visualization, Data centers, Solids, Data processing, Optical inspection

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Critical dimension metrology, Machine learning, Data modeling, Process control, Visualization, Data centers, Solids, Detection and tracking algorithms, Data processing, Optical inspection

Proceedings Article | 12 November 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Photomasks, SRAF, Calibration, Cadmium, Lithography, Double patterning technology, Data modeling, Etching, Vestigial sideband modulation, Scanning electron microscopy

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Calibration, Extreme ultraviolet lithography, Critical dimension metrology, Mask making

Showing 5 of 24 publications
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