Dr. Christian Crell
Staff Engineer
SPIE Involvement:
Author
Area of Expertise:
lithography mask technology , technical buyer , supplier management , project management , customer consulting
Publications (3)

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 9 April 2001 Paper
Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Contamination, Defect detection, Detection and tracking algorithms, Inspection, Photomasks, Algorithm development, Signal detection, Phase shifts, Defect inspection

Proceedings Article | 3 February 2000 Paper
Proc. SPIE. 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Phase shifting, Etching, Quartz, Ions, Inspection, Chromium, Printing, Photomasks, Semiconducting wafers, Phase shifts

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