Christian Ehrlich
International Business Development Manager at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Manufacturing, Image restoration, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Overlay metrology

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Image processing, Image resolution, Image analysis, Scanning electron microscopy, Photomasks, Nanoimprint lithography

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Electron beams, Visualization, Imaging systems, Opacity, Sensors, Quartz, Inspection, Bridges, Photomasks, Phase shifts

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beams, Metrology, Imaging systems, Opacity, Sensors, Inspection, Photomasks, Phase measurement, Phase shifts

Proceedings Article | 21 June 2006 Paper
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Electron beams, Magnesium, Gemini Observatory, Imaging systems, Etching, Quartz, Inspection, Photomasks, Binary data, Phase shifts

Showing 5 of 13 publications
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