Dr. Christian Laubis
at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Scattering, X-rays, Inverse problems, Finite element methods

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Optical properties, Etching, Metals, Photomasks, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Photodetectors, Sensors, Calibration, Photodiodes, Diodes, Extreme ultraviolet, Charge-coupled devices, CCD image sensors, X-ray detectors

Proceedings Article | 10 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Refractive index, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Material characterization, Tellurium

Proceedings Article | 9 October 2018 Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical components, Mirrors, Reflectivity, Reflectometry, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 42 publications
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