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Christian Pampfer
at RI Research Instruments GmbH
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 16 October 2019 Presentation
Standalone tools for actinic EUV pellicle qualification (Conference Presentation)
Rainer Lebert, Andreas Biermanns-Föth, Christian Pampfer, Christoph Phiesel, Thomas Missalla, Jennifer Arps, Gordon Staab, Christian Piel
Proceedings Volume 11147, 111470T (2019) https://doi.org/10.1117/12.2537618
KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Reflectivity, Thin films, EUV optics, Scanners, Reflection, Precision measurement
Proceedings Article | 27 June 2019 Paper
EUV pellicle qualification on transmission and reflectance
T. Missalla, A. Biermanns-Föth, C. Pampfer, J. Arps, C. Phiesel, C. Piel, R. Lebert
Proceedings Volume 11178, 111780O (2019) https://doi.org/10.1117/12.2537611
KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Reflection, Scanners, Mirrors, Charge-coupled devices, Extreme ultraviolet lithography, Optical filters, Metrology
Proceedings Article | 14 March 2019 Presentation
EUV pellicle qualification on transmission and reflectance
Rainer Lebert, Christian Pampfer, Andreas Biermanns-Foeth, Thomas Missalla, Christoph Phiesel, Christian Piel
Proceedings Volume 10957, 109570Y (2019) https://doi.org/10.1117/12.2515341
KEYWORDS: Pellicles, Extreme ultraviolet, Reflectivity, Optical filters, Scanners, Carbon
Proceedings Article | 3 October 2018 Paper
A tool for full area inband EUV transmission mapping of EUV pellicles
C. Pampfer, A. Biermanns-Föth, T. Missalla, J. Arps, C. Phiesel, C. Piel, R. Lebert
Proceedings Volume 10809, 108091E (2018) https://doi.org/10.1117/12.2501804
KEYWORDS: Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Metrology, Thin films
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