Dr. Christian Wies
at AIXUV GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Metrology, Particles, Reflectivity, Quality measurement, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Factor analysis

Proceedings Article | 16 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Optical lithography, Spectroscopy, Inspection, Reflectivity, Process control, Extreme ultraviolet, Charge-coupled devices, Geometrical optics, Spectrophotometry, EUV optics

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Mirrors, Electrodes, Scanners, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 29 August 2006 Paper
Proc. SPIE. 6317, Advances in X-Ray/EUV Optics, Components, and Applications
KEYWORDS: Gold, Optical components, Calibration, Spectroscopy, Silicon, Reflectivity, CCD cameras, Spectral resolution, Transmittance, Spectrophotometry

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Reflectivity, Magnetism, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top