Dr. Christina L. Porter
at ASML
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 27 April 2023 Presentation + Paper
Christina Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar el Gawhary, Simon Mathijssen, Peter Engblom, Heidi Chin, William Blanton, Sury Ganesan, Brian Krist, Florian Gstrein, Mark Phillips
Proceedings Volume 12496, 124961I (2023) https://doi.org/10.1117/12.2658495
KEYWORDS: Etching, Metrology, Overlay metrology, Signal detection, Diffraction, Semiconducting wafers, 3D metrology, X-rays, Nanosheets, Scatterometry

Proceedings Article | 26 March 2019 Presentation
Proceedings Volume 10959, 109590G (2019) https://doi.org/10.1117/12.2516827
KEYWORDS: Extreme ultraviolet, Stereoscopy, Reflectometry, 3D image processing

Proceedings Article | 26 March 2019 Presentation
Proceedings Volume 10959, 109590W (2019) https://doi.org/10.1117/12.2517026
KEYWORDS: Nanoimaging, Extreme ultraviolet

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105850M (2018) https://doi.org/10.1117/12.2297464
KEYWORDS: Reflectometry, Reflectivity, Extreme ultraviolet, Silicon, Coherence imaging, Cameras, Stereoscopy, 3D image processing, 3D metrology, Profiling

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10585, 105852O (2018) https://doi.org/10.1117/12.2307861
KEYWORDS: Coherence imaging, Extreme ultraviolet, Extreme ultraviolet lithography, Pellicles, Photomasks, Imaging systems, Metrology, Wafer-level optics, Reflectivity, Semiconducting wafers

Showing 5 of 11 publications
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