Christina Turley
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Reticles, Scanners, Manufacturing, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Overlay metrology

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Statistical analysis, Lithographic illumination, Scanners, Error analysis, Distortion, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 September 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Defect detection, Sensors, Error analysis, Inspection, Attenuators, Photomasks, Optical proximity correction, Semiconducting wafers

SPIE Journal Paper | 12 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Multilayers, Etching, Deep ultraviolet, Scanning electron microscopy

Proceedings Article | 19 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Defect detection, Inspection, Optical inspection, Nonlinear optics, Wafer inspection, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Showing 5 of 9 publications
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